Transistor having high dielectric constant gate insulating layer and source and drain forming Schottky contact with substrate

ABSTRACT

The invention is directed to a device for regulating the flow of electric current with high dielectric constant gate insulating layer and a source and/or drain forming a Schottky contact or Schottky-like region with a substrate and its fabrication method. In one aspect, the gate insulating layer has a dielectric constant greater than the dielectric constant of silicon. In another aspect, the current regulating device may be a MOSFET device, optionally a planar P-type or N-type MOSFET, having any orientation. In another aspect, the source and/or drain may consist partially or fully of a silicide.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation-in-part of U.S. patent applicationSer. No. 09/928,124, filed Aug. 10, 2001, now abandoned and of U.S.patent application Ser. No. 09/928,163, filed Aug. 10, 2001, nowabandoned. This application claims further priority to U.S. provisionalpatent application No. 60/381,320, filed on May 16, 2002, which isincorporated by reference in its entirety.

BACKGROUND OF THE INVENTION

The present invention is directed to devices that regulate the flow ofelectric current and their fabrication methods. More specifically, thepresent invention is directed to Schottky-barrier source and/or draintransistors.

An electric current flow regulating device such as semiconductor device100 (for example a transistor), seen in prior art FIG. 1, may include asilicon substrate 110, with an impurity doped source 120 and impuritydoped drain 130. Source 120 and drain 130 are separated by a channelregion 140. Atop the channel region 140 is an insulating layer 150.Insulating layer 150 typically consists of silicon dioxide, which has adielectric constant of 3.9. A gate electrode 160, made from electricallyconductive material, is located on top of the insulating layer 150.

When a voltage V_(G) is applied to the gate electrode 160, current flowsbetween the source 120 and drain 130 through the channel region 140.This current is referred to as the drive current, or I_(D). For digitalapplications, a voltage V_(G) can be applied to the gate electrode 160,to turn the semiconductor device 100 “on.” In this state, thesemiconductor device will have a relatively large drive current, ideallylimited only by the resistance of the channel region 140. A differentvoltage V_(G) can be applied to the gate electrode 160 to turn thesemiconductor device 100 “off.” In this state, the ideal leakage currentis zero. However, in practical applications, the drive current in the“on” state is not ideal because of parasitic impedances associated withother parts of the semiconductor device 100. For example, the source anddrain regions have a finite impedance, resulting in a parasiticimpedance which adds to the resistance of the channel region. Also, inpractical applications, there is a certain finite amount of leakagecurrent when the semiconductor device is “off.”

In prior art current regulating devices, the drive current is linearlyproportional to the dielectric constant K of the insulating layer 150,and linearly inversely proportional to the thickness T_(ins) of theinsulating layer 150. The drive current I_(D) is approximated by therelationship:I _(D) ˜K/T _(ins)where K is the dielectric constant of the insulating layer and T_(ins)is the thickness of the insulating layer.

One consideration in the design of current regulating devices isreducing the amount of power required to achieve a desired drivecurrent. One way to reduce power consumption is by using a metal sourceand drain and a simple, uniformly implanted channel dopant profile, asdescribed in copending U.S. patent applications Ser. No. 09/465,357,filed on Dec. 16, 1999, entitled “METHOD OF MANUFACTURING ASHORT-CHANNEL FET WITH SCHOTTKY BARRIER SOURCE AND DRAIN CONTACTS,” andSer. No. 09/777,536, filed on Feb. 6, 2001, entitled “MOSFET DEVICE ANDMANUFACTURING METHOD,” the contents of which are hereby incorporated byreference.

Another consideration in the design of current regulating devices is themanufacturability. One way to improve the manufacturability of currentregulating devices having gate insulators with high dielectric constantmaterials is to form the source and drain electrodes using a lowtemperature process such as that used for formation of Schottky orSchottky-like source and drain electrodes, as described in U.S.Provisional Patent Application 60/381,320, filed on May 16, 2002,entitled “LOW TEMPERATURE SOURCE AND DRAIN FORMATION PROCESS STEPS FORTHE MANUFACTURE OF MOSFET DEVICES,” the contents of which are herebyincorporated by reference.

There is a need in the art for a device for regulating the flow ofelectric current, which exhibits an improved drive current in the “on”state. There is a further need in the art for a method of manufacturingsuch a device at reduced temperatures.

BRIEF SUMMARY OF THE INVENTION

By using the invention disclosed herein the drive currentcharacteristics can be improved, resulting in a non-linear relationshipbetween the drive current I_(D) and both the dielectric constant (K) ofthe insulating layer and the thickness of the insulating layer T_(ins).The resulting relationship results in current regulating devices thatare more sensitive to variations in K and T_(ins) compared to the priorart. Furthermore, by using the invention disclosed herein, themanufacturability of new gate insulator materials is improvedsubstantially.

In one aspect, the invention provides a method for manufacturing adevice for regulating the flow of electrical current. The methodincludes the steps of providing for a semiconductor substrate; providingfor an electrically insulating layer in contact with the semiconductorsubstrate, the insulating layer having a dielectric constant greaterthan 4.0; providing for a gate electrode in contact with at least aportion of the insulating layer; and providing a source electrode and adrain electrode in contact with the semiconductor substrate and proximalto the gate electrode wherein at least one of the source electrode andthe drain electrode forms a Schottky contact or Schottky-like regionwith the semiconductor substrate. In one aspect, the device forregulating the flow of electrical current may be a Metal OxideSemiconductor Field Effect Transistor (MOSFET) device. In anotheraspect, the dielectric constant may be greater than 7.6 or greater than15.

In another aspect, the source and drain electrodes may be formed from amember of the group consisting of: platinum suicide, palladium silicideand iridium silicide. In another aspect, the source and drain electrodesmay be formed from a member of the group consisting of the rare earthsuicides. In another aspect, the insulating layer may be formed from amember of the group consisting of the metal oxides. In another aspect,the Schottky contact or Schottky-like region may be at least in areasadjacent to the channel. In another aspect, an entire interface betweenat least one of the source and the drain electrodes and thesemiconductor substrate may form a Schottky contact or Schottky-likeregion with the semiconductor substrate. In another aspect, the channelregion may be doped.

In another aspect, the invention provides a method for manufacturing adevice for regulating the flow of electrical current. The methodincludes the steps of providing for a semiconductor substrate; providingfor an electrically insulating layer in contact with the semiconductorsubstrate, the insulating layer having a dielectric constant greaterthan 4.0; providing for a gate electrode located in contact with atleast a portion of the insulating layer; exposing the semiconductorsubstrate on one or more areas proximal to the gate electrode; providingfor a thin film of metal on at least a portion of the exposedsemiconductor substrate; and reacting the metal with the exposedsemiconductor substrate such that a Schottky or Schottky-like sourceelectrode and a drain electrode are formed on the semiconductorsubstrate. In one aspect, the device for regulating the flow ofelectrical current may be a MOSFET device. In another aspect, thedielectric constant may be greater than 7.6 or greater than 15.

In another aspect, the gate electrode may be provided by the steps ofdepositing a thin conducting film on the insulating layer; patterningand etching the conducting film to form a gate electrode; and formingone or more thin insulating layers on one or more sidewalls of the gateelectrode. In another aspect, the method may include the step ofremoving metal not reacted during the reacting process. In anotheraspect, the reacting may include thermal annealing. In another aspect,the source and drain electrodes may be formed from a member of the groupconsisting of: platinum silicide, palladium silicide and iridiumsilicide. In another aspect, the source and drain electrodes may beformed from a member of the group consisting of the rare earthsilicides. In another aspect, the insulating layer may be formed from amember of the group consisting of metal oxides. In another aspect, theSchottky contact or Schottky-like region may be formed at least in areasadjacent to the channel. In another aspect, an entire interface betweenat least one of the source electrode and the drain electrode and thesemiconductor substrate may form a Schottky contact or Schottky-likeregion with the semiconductor substrate. In another aspect, dopants maybe introduced into the channel region.

In another aspect, the invention provides a device for regulating theflow of electrical current. The device includes a semiconductorsubstrate, a gate electrode, an electrically insulating layer locatedbetween the gate electrode and the semiconductor substrate, theinsulating layer having a dielectric constant greater than 4.0, and asource electrode and a drain electrode in contact with the semiconductorsubstrate and proximal to the gate electrode wherein at least one of thesource electrode and the drain electrode forms a Schottky contactorSchottky-like region with the semiconductor substrate. In one aspect,the device for regulating the flow of electrical current may be a MetalOxide Semiconductor Field Effect Transistor (MOSFET) device. In anotheraspect, the dielectric constant may be greater than 7.6 or greater than15.

In another aspect, the source and drain electrodes may be formed from amember of the group consisting of: platinum silicide, palladium silicideand iridium silicide. In another aspect, the source and drain electrodesmay be formed from a member of the group consisting of the rare earthsilicides. In another aspect, the insulating layer may be formed from amember of the metal oxides. In another aspect, the Schottky contact orSchottky-like region may be at least in areas adjacent to the channel.In another aspect, an entire interface between at least one of thesource and the drain electrodes and the semiconductor substrate may forma Schottky contact or Schottky-like region with the semiconductorsubstrate. In another aspect, the channel region may be doped.

Aspects of the invention can include one or more of the followingadvantages. Conventional field effect transistors (FET) and othercurrent regulating devices require a higher voltage than thosefabricated in accordance with the invention to produce a similar drivecurrent from source to drain. In an optimized conventional FET orcurrent regulating device, the drive current varies generally linearlywith the ratio of the insulating layer's dielectric constant to itsthickness. One of the advantages of the invention is the unexpectedresult of the drive current being more sensitive to dielectric constantK than to T_(ins), implying larger drive current I_(D) for larger K andconstant K/T_(ins) ratio. These results are achieved by coupling aSchottky or Schottky-like source and/or drain with an insulating layermade of a high dielectric constant material. Lower voltage is requiredto produce high source to drain currents which results in lower powerconsumption for microelectronics utilizing this architecture.

Furthermore, the well-known benefit of achieving less gate leakagecurrent (between gate and source/drain electrodes) by using larger K andconstant K/T_(ins) ratio, will still be observed in the presentinvention. For conventionally architected devices this particularbenefit is the sole reason for using materials for the gate insulatorhaving larger dielectric constants K than that of silicon dioxide, whichhas a dielectric constant of 3.9. These materials are denoted as “highK” materials. No other significant benefit is expected or observed. Byusing Schottky or Schottky-like source/drain devices in combination witha larger K, an unexpected and dramatic improvement in drive currentI_(d) is achieved in addition to the reduction in gate leakage current.

Although there is a strong motivation for the industry to adopt new highK gate insulator materials due to the problem of gate leakage current,there are technical obstacles that make production of high K gateinsulators challenging. One of the most important problems is thedegradation of the high K gate insulator materials during hightemperature processing required for the formation of the impurity dopedsource and drain regions. This degradation is caused by reactions withneighboring materials such as the silicon in the channel region or thegate electrode. The processing steps for the formation of the Schottkyor Schottky-like source/drain regions occur at much lower temperaturessuch as 400° C. as compared to 1000° C. required for impurity dopedsource and drain formation. As a result of the significantly lowertemperature processing steps for the formation of the Schottky orSchottky-like source/drain regions, the high K materials do not reactsubstantially with the neighboring materials. Therefore, another benefitof using Schottky or Schottky-like source/drain devices in combinationwith high K gate insulator materials is the improved manufacturabilityof high K gate insulators.

While multiple embodiments are disclosed, still other embodiments of thepresent invention will become apparent to those skilled in the art fromthe following detailed description, which shows and describesillustrative embodiments of the invention. As will be realized, theinvention is capable of modifications in various obvious aspects, allwithout departing from the spirit and scope of the present invention.Accordingly, the drawings and detailed description are to be regarded asillustrative in nature and not restrictive.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a cross-section of a prior art semiconductor transistor.

FIG. 2 is a cross-section of a semiconductor substrate with Schottkycontact source and drain combined with a non-silicon dioxide insulatinglayer between the gate and channel region.

FIG. 3 a is a cross-section of a semiconductor device with Schottkycontact source and drain combined with a non-silicon dioxide insulatinglayer between the gate and channel region. This is the device structureused for numerical simulations.

FIG. 3 b is a logarithmic plot showing the simulated relationshipbetween the drive current I_(D) and gate voltage V_(G) for various Kvalues, with the ratio K/T_(ins) held constant.

FIG. 3 c is a linear plot with the same data as FIG. 3 b.

FIG. 4 a is a cross-section of a semiconductor device with Schottkycontact source and drain combined with a non-silicon dioxide insulatinglayer between the gate and channel region. This is the device structureused for a second set of numerical simulations.

FIG. 4 b is a logarithmic plot showing the simulated relationshipbetween the drive current I_(D) and gate voltage V_(G) for various Kvalues, with the ratio K/T_(ins) held constant.

FIG. 4 c is a linear plot with the same data as FIG. 4 b.

FIG. 5 is a cross-section of semiconductor substrate after ionimplantation.

FIG. 6 is a cross-section of semiconductor substrate after insulatinglayer growth and gate patterning.

FIG. 7 is a cross-section of semiconductor substrate after growth of anoxide layer on the sidewalls.

FIG. 8 is a cross-section of semiconductor substrate after creation of ametal silicide source and drain.

FIG. 9 is a cross-section of the semiconductor device resulting from theprocess steps outlined in FIG. 10.

FIG. 10 is a flow chart outlining the process flow for the fabricationof a device for regulating flow of electric current in accordance withthe invention.

Like reference symbols in the various drawings indicate like elements.

DETAILED DESCRIPTION

Referring to FIG. 2, semiconductor device 200 includes a substrate 210in which a source 220 and drain 230 are formed. Substrate 210 may becomposed of silicon or may be a silicon-on-insulator (SOI) substrate.Source 220 and/or drain 230 may be composed partially or fully of a rareearth silicide. Source 220 and/or drain 230 may also be composedpartially or fully of platinum silicide, palladium silicide or iridiumsilicide. Because the source and drain are composed in part of a metal,they form Schottky contacts or Schottky-like regions 270, 275 with thesubstrate 210, where a “Schottky contact” is defined by the contactbetween a metal and a semiconductor, and a “Schottky-like region” is aregion formed by the close proximity of a semiconductor and a metal. TheSchottky contacts or Schottky-like regions 270, 275 can be formed byforming the source and/or drain from a metal silicide. The Schottkycontacts or Schottky-like regions 270, 275 are in an area adjacent to achannel region 240 formed between the source 220 and drain 230. Theentire interface between either or both of the source 220 and the drain230 may form a Schottky contact or Schottky-like region 270, 275 withthe substrate 210. The channel region 240 may be impurity doped wherethe doping may be conventional non-uniform doping or may be uniformdoping as described in copending U.S. patent application Ser. No.09/465,357 and U.S. patent application Ser. No. 09/777,536.

An insulating layer 250 is formed on top of the channel region 240 andmay be formed on part or all of the source 220 and drain 230. Theinsulating layer 250 is composed of a material with a dielectricconstant greater than that of silicon dioxide; e.g. a dielectricconstant greater than 3.9. For example, insulating layer 250 may becomposed of a metal oxide such as TaO₂ with a dielectric constant ofapproximately 25, TiO₂ with a dielectric constant of approximately50-60, HfO₂ with a dialectic constant of approximately 15-20, or ZrO₂with a dielectric constant of approximately 15-20. The insulating layer250 may consist of a dielectric with a modest K value (e.g., 5-10), suchas nitride/oxide or oxy-nitride stack; a medium K value (e.g., 10-20),such as unary oxides Ta₂O₃, TiO₂, ZrO₂, HfO₂, Y₂O₃, La₂O₃, Gd₂O₃, Sc₂O₃or silicates ZrSiO4, HfSiO₄, TiSiO₄; or a high K value (e.g., greaterthan 20) such as amorphous LaAlO₃, ZrTiO₄, SnTiO₄, or SrZrO₄, or singlecrystals LaAl₃O₄, BaZrO₃, Y₂O₃, La₂O₃. Optionally, to improvemanufacturability issues associated with transition metals, theinsulating layer 250 may consist of more than one layer. The insulatinglayer 250 may be formed with a “bi-layer” approach and may consist ofmore than one type of dielectric, e.g., TiO₂ on top of Si₃N₄. A gateelectrode 260 is positioned on top of the insulating layer 250. A thininsulating layer 225 surrounds the gate electrode 260.

By forming a semiconductor device with (1) a source 220 or drain 230forming a Schottky contact or Schottky-like region 270, 275 with thesubstrate 110; and (2) an insulating layer 250 with a relatively highdielectric constant, one is able to achieve a larger drive current I_(D)for larger K, but constant K/T_(ins).

Referring to FIGS. 3 a-c, full two dimensional electrostatic simulationswere performed on the MOSFET device 305 structure of FIG. 3 a, forvarious insulating layer 309 thicknesses T_(ins) 307 and insulatordielectric constants K. The simulation assumes the following:

1) P type MOS semiconductor device 305, metallic source 301/drain 303 at300 K.

2) Metallic source 301/drain 303 with radius of curvature R 311 of 10nm.

3) Channel length L 313 of 25 nm, drain voltage V_(D) of 1.2V.

4) No significant charge, either fixed or mobile, in the siliconsubstrate 315.

5) The drain current, I_(D), is limited solely by the emission processat the source 301 end of the semiconductor device 305.

6) The current density versus electric field (J vs. E) characteristicfor the emission process at the source 301 is modeled after a platinumsilicide-to-silicon Schottky contact. The Schottky barrier height isassumed to be 0.187 eV, hole effective mass in the silicon is 0.66 mo,fermi level is at 5.4 eV, and temperature is 300 K. For a given electricfield strength at a particular point on the source 301, the currentdensity is calculated via a complete, no approximations solution to theSchroedinger equation assuming a 1-D sharp triangular barrier. Theeffects of quantum tunneling and reflection have been fully included.Because the total current density is integrated across the density ofstates, currents due to field emission, thermal emission, and thermallyassisted field emission have been accounted for. The J vs. Erelationship has been calibrated to experimental data for the purethermal emission case (E=0).

These assumptions are valid in the real world case of short channel (<25nm) and undoped (or lightly doped) substrates. Although the absolutevalues of the calculated source 301 emission currents have not beencalibrated for E>0, they are based on some experimental data andfirst-principles calculations. For the purposes of the proposedinvention, the calculated J vs. E data is sufficient as the primaryinterest relates to the effect of the insulating layer 309 thickness(T_(ins)) 307 and dielectric constant (K) on source 301 emissioncurrent. Relative changes in source 301 emission current with T_(ins)and K are more relevant, in this case, than the absolute value of thecurrent. Nevertheless, calculated values of both leakage and drivecurrents I_(D) are in good agreement with the measured data of actualtransistors.

Simulations were run with a constant K/T_(ins) ratio of 0.156. Theresults are shown in FIGS. 3 b-c. Starting with FIG. 3 c, workingupwards, curve 350 shows the relationship between the gate voltage V_(G)and the drive current I_(D) in a semiconductor device with an insulatinglayer dielectric constant of 3.9 (T_(ins)=25 Å). Curves 360, 370 and 380show the ratio of V_(G) and I_(D) in semiconductor devices with sources220 and drains 230 that form a Schottky contact or Schottky-like region270, 275 with the substrate and insulating dielectric constants of 10(T_(ins)=64.1 Å), 25 (T_(ins)=160.3 Å), and 50 (T_(ins)=320.5 Å),respectively. Referring to FIG. 3 b, curve 355 shows the logarithmicrelationship between the gate voltage V_(G) and the drive current I_(D)in a semiconductor device with an insulating layer dielectric constantof 3.9 (T_(ins)=25 Å). Curves 365, 375 and 385 show the logarithmicratio of V_(G) and I_(D) in semiconductor devices with sources 220 anddrains 230 that form a Schottky contact or Schottky-like region 270, 275with the substrate and insulating dielectric constants of 10(T_(ins)=64.1 Å), 25 (T_(ins)=160.3 Å), and 50 (T_(ins)=320.5 Å),respectively. It is expected that similar results would be achievedregardless of the radius of curvature R 311, channel length 313 anddrain voltage V_(D). Drive current to leakage current ratios are 35, 38,53 and 86 for the curves 350/355, 360/365, 370/375 and 380/385,respectively. Leakage currents can be lowered by at least a factor of10, without sacrificing drive currents, by the addition of theappropriate dopants in the substrate (to control bulk-punch throughcurrents) or by a reduction in operating temperature. Thus, by using asource 301 or drain 303 that forms a Schottky contact or Schottky-likeregion with the substrate, and by increasing K while maintaining aconstant K/T_(ins) ratio, the drive current I_(D) increasessignificantly (from a little over 300 μA/μm for a V_(G) of 1.2V toapproximately 1300 μA/μm). Thus, for a desired drive current, a devicewould need a significantly lower voltage to operate than that requiredby the prior art. Because power consumption varies with the square ofthe voltage, the invention provides for significantly lower power usage.

To verify that changing the radius of curvature R 311 does not changethe observed dramatic improvement in I_(D), full 2-D electrostaticsimulations were repeated on a slightly different device geometry.Referring to FIGS. 4 a-c, the semiconductor device 405 structure of FIG.4 a was simulated for two insulating layer 409 thicknesses T_(ins) 407and insulator dielectric constants K, such that the ratio K/T_(ins) wasconstant. The simulation assumptions are the same as noted above, withthe exception of the device geometry:

1) The channel length L 413 is 27 nm

2) The width 402 and height 404 of the source and drain are 100 nm and30 nm respectively.

3) The width 412 and height 413 of the gate are 67 nm and 108 nmrespectively.

4) The radius of curvature R_(g) 414 of the gate was 10 nm for allsimulations.

5) The radius of curvature R 411 of the source and drain electrodes waseither 1 nm or 10 nm.

Simulations were run with a constant K/T_(ins) ratio of 0.205. Theresults are shown in FIGS. 4 b-c. Starting with FIG. 4 c, curves 451 and461 show the relationship between the gate voltage Vg and the drivecurrent I_(D) in a semiconductor device having a radius of curvature R411 of 10 nm with an insulating layer dielectric constant of 3.9(T_(ins)=25 Å) and 50 (T_(ins)=244 Å), respectively. Continuing withFIG. 4 c, curves 471 and 481 show the relationship between the gatevoltage Vg and the drive current I_(D) in a semiconductor device havinga radius of curvature R 411 of 1 nm with an insulating layer dielectricconstant of 3.9 (T_(ins)=25 Å) and 50 (T_(ins)=244 Å), respectively.Referring to FIG. 4 b, curves 455 and 465 show the logarithmicrelationship between the gate voltage Vg and the drive current I_(D) ina semiconductor device having a radius of curvature R 411 of 10 nm withan insulating layer dielectric constant of 3.9 (T_(ins)=25 Å) and 50(T_(ins)=244 Å), respectively. Continuing with FIG. 4 b, curves 475 and485 show the relationship between the gate voltage Vg and the drivecurrent ID in a semiconductor device having a radius of curvature R 411of 1 nm with an insulating layer dielectric constant of 3.9 (T_(ins)=25Å) and 50 (T_(ins)=244 Å), respectively. FIGS. 4 b-c show that by usinga source 401 or drain 403 that forms a Schottky contact or Schottky-likeregion with the substrate, and by increasing K while maintaining aconstant K/T_(ins) ratio, the drive current I_(D) increasessignificantly (from approximately 650 mA/mm for a Vg of 1.2V toapproximately 1700 mA/mm) for a device having a radius of curvature R411 of 10 nm. The ratio of drive currents for the K=50 to the K=3.9 caseis 1700/650=2.6. Likewise, for the device having a radius of curvature R411 of 1 nm, the drive current I_(D) increases significantly (fromapproximately 570 mA/mm for a Vg of 1.2V to approximately 2340 mA/mm).In this case, the ratio of drive current for the K=50 to the K=3.9 caseis 2340/570=4.1. These results indicate that the relative improvement indrive current I_(D) grows larger for smaller radii of curvature R 411.Further, these results indicate that increasing the ratio K/T_(ins) willlead to larger improvements in drive current Id as compared to the caseof constant K/T_(ins). A conventional impurity doped source and draindevice would have approximately the same drive current I_(D) for bothK=3.9 and K=50 cases having constant K/T_(ins).

Cross sectional scanning electron micrographs of the source and draincorner regions indicate that the radius of curvature R 411 for the topcorner of the source 421 and top corner of the drain 422 electrodeadjacent to the channel region are closer to 1 nm, rather than 10 nm.The simulation predictions of FIGS. 4 a-c indicate that for a desireddrive current, by using a source 401 or drain 403 that forms a Schottkycontact or Schottky-like region with the substrate, and by using high Kdielectric gate insulator materials, the device would need asignificantly lower voltage to operate than that required by the priorart. Because power consumption varies with the square of the voltage,the invention provides for significantly lower power usage.

The device for regulating flow of electric current described above, forexample a planar P-type or N-type MOSFET, may be formed using theprocess shown in FIGS. 5-9 and described in FIG. 10. (Note that theplanar P-type or N-type MOSFET need not be planar in the horizontaldirection, but may assume any planar orientation.) Referring to FIGS. 5and 10, a thin screen oxide 323 is grown on silicon substrate 310, thesubstrate 310 having a means for electrically isolating transistors fromone another (905). The thin screen oxide, optionally a thickness of 200Å, acts as the implant mask for the channel region 340 doping. Theappropriate channel dopant species (for example Arsenic and Indium forP-type and N-type devices respectively) is then ion-implanted throughthe screen oxide 323 to a pre-determined depth in the silicon (forexample, 1000 Å) (910).

Referring to FIGS. 6 and 10, the screen oxide layer 323 of FIG. 5 isremoved with hydro-fluoric acid (915), and the thin insulating layer 450is either grown or deposited at least on a portion of the channel region340 (920). This insulating layer may consist of TiO₂, TaO₂, or any otherappropriate compound with a high dielectric constant as discussed above.Immediately following the insulating layer growth or deposition, anin-situ heavily doped silicon film is deposited (930). This silicon filmwill eventually make up the gate electrode. The silicon film may bedoped with phosphorus for an N-type device or boron for a P-type device.The gate electrode is then patterned with a lithographic technique andsilicon etch that is highly selective to the insulating layer 450 (935).

Referring to FIGS. 7 and 10, a thin oxide, optionally approximately 100Å in thickness, is formed on the top surface and sidewalls of the gateelectrode (940). Some of the oxide layers then are removed byanisotropic etch to expose the silicon on the horizontal surfaces 510,while preserving it on the vertical surfaces (945). This step servesboth to create a gate sidewall oxide 525 and to electrically activatethe dopants in the gate electrode and channel region 340 of the device.

Referring to FIGS. 8 and 10, a metal is deposited as a blanket film,optionally approximately 400 Å thick, on all surfaces (950). Theparticular metal deposited will depend on whether the device is N-typeor P-type. Platinum may be used for the P-type device while erbium maybe used for an N-type device. The semiconductor device 600 is thenannealed for a specified time at a specified temperature, for example,45 minutes at 400° C. (955). This temperature is much less thetemperature typically required to form impurity doped source and drains,which is usually greater than 800° C. Where the metal is in directcontact with the silicon, the annealing process causes a chemicalreaction that converts the metal to a metal silicide 606. The metal 616not in contact with silicon does not react.

Referring to FIGS. 9 and 10, the unreacted metal 616 is removed with awet chemical etch (960). For example, if the deposited metal wasplatinum or erbium, aqua regia or HNO3, respectively, may be used toremove it. The suicide electrodes that remain are the source 620 anddrain 630. The Schottky device for regulating flow of electric currentwith a high dielectric constant insulating layer is now complete andready for electrical contacting to gate electrode 460, source 620, anddrain 630 (965). Because the temperature required to form the Schottkyor Schottky-like source and drain electrodes in this process is muchlower then that required for impurity doped source 620 and drain 630regions, the high K material used for the gate insulator 450 is muchless likely to react with neighboring materials, making this processmuch more manufacturable than the prior art.

A number of embodiments of the invention have been described.Nevertheless, it will be understood that various modifications may bemade without departing from the spirit and scope of the invention. Forexample, the semiconductor devices illustrated in the claims are by wayof example only. It should be understood that the concepts of theinvention apply to semiconductor devices with a variety ofcross-sections. And, although the invention has been illustrated withrespect to planar silicon MOS transistors, it can apply equally well toother devices for regulating the flow of electrical current. Forexample, devices built on other semiconductor substrates such as galliumarsenide GaAs, indium phosphide InP, silicon carbide SiC, silicongermanium SiGe, etc. Further, the device is not required to have anyparticular radius of curvature for the source and drain electrodecorners. And, the invention is not limited to any particular ratio(s) ofK/T_(ins). Accordingly, other embodiments are within the scope of thefollowing claims.

Although the present invention has been described with reference topreferred embodiments, persons skilled in the art will recognize thatchanges may be made in form and detail without departing from the spiritand scope of the invention.

1. A device for regulating the flow of electrical current, the devicecomprising: a semiconductor substrate; a gate electrode; an electricallyinsulating layer located between the gate electrode and thesemiconductor substrate, the insulating layer having a dielectricconstant greater than 4.0; a source electrode and a drain electrode incontact with the semiconductor substrate and proximal to the gateelectrode wherein at least one of the source electrode and the drainelectrode forms a Schottky contact or Schottky-like region with thesemiconductor substrate; and wherein the source and drain electrodes areformed from a member of the group consisting of: platinum suicide,palladium silicide and iridium suicide.
 2. A device for regulating theflow of electrical current, the device comprising: a semiconductorsubstrate; a gate electrode; an electrically insulating layer locatedbetween the gate electrode and the semiconductor substrate, theinsulating layer having a dielectric constant greater than 4.0; a sourceelectrode and a drain electrode in contact with the semiconductorsubstrate and proximal to the gate electrode wherein at least one of thesource electrode and the drain electrode forms a Schottky contact orSchottky-like region with the semiconductor substrate; and wherein theinsulating layer is formed from an oxy-nitride stack.
 3. The device ofclaim 1, wherein the insulating layer is formed from a member of thegroup consisting of metal oxides.
 4. The device of claim 1, wherein theinsulating layer is formed from an oxy-nitride stack.
 5. The device ofclaim 4, wherein the Schottky contact or Schottky-like region is formedat least in areas adjacent to a channel region formed between the sourceelectrode and the drain electrode, and wherein the channel region isdoped.
 6. A device for regulating the flow of electrical current, thedevice comprising: a semiconductor substrate; a gate electrode; anelectrically insulating layer located between the gate electrode and thesemiconductor substrate, the insulating layer having a dielectricconstant greater than 7.6; a source electrode and a drain electrode incontact with the semiconductor substrate and proximal to the gateelectrode wherein at least one of the source electrode and the drainelectrode forms a Schottky contact or Schottky-like region with thesemiconductor substrate; and wherein the source and drain electrodes areformed from a member of the group consisting of: platinum suicide,palladium suicide and iridium suicide.
 7. A device for regulating theflow of electrical current, the device comprising: a semiconductorsubstrate; a gate electrode; an electrically insulating layer locatedbetween the gate electrode and the semiconductor substrate, theinsulating layer having a dielectric constant greater than 7.6; a sourceelectrode and a drain electrode in contact with the semiconductorsubstrate and proximal to the gate electrode wherein at least one of thesource electrode and the drain electrode forms a Schottky contact orSchottky-like region with the semiconductor substrate; and wherein theinsulating layer is formed from an oxy-nitride stack.
 8. A device forregulating the flow of electrical current, the device comprising: asemiconductor substrate; a gate electrode; an electrically insulatinglayer located between the gate electrode and the semiconductorsubstrate, the insulating layer having a dielectric constant greaterthan 15; a source electrode and a drain electrode in contact with thesemiconductor substrate and proximal to the gate electrode wherein atleast one of the source electrode and the drain electrode forms aSchottky contact or Schottky-like region with the semiconductorsubstrate; and wherein the source and drain electrodes are formed from amember of the group consisting of platinum suicide, palladium suicideand iridium suicide.
 9. A device for regulating the flow of electricalcurrent, the device comprising: a semiconductor substrate; a gateelectrode; an electrically insulating layer located between the gateelectrode and the semiconductor substrate, the insulating layer having adielectric constant greater than 15; a source electrode and a drainelectrode in contact with the semiconductor substrate and proximal tothe gate electrode wherein at least one of the source electrode and thedrain electrode forms a Schottky contact or Schottky-like region withthe semiconductor substrate; and wherein the insulating layer is formedfrom an oxy-nitride stack.